Method of and apparatus for detecting pattern defects
US4803734A · kind A · utility
44Cited by
6References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 10, 1986 |
| Grant date | Feb 7, 1989 |
| Priority date | — |
| Expiry date | Dec 10, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The periphery of an area of a master pattern is expanded by a required number of pixels to define a plurality of master pattern areas two-dimensionally misregistered pixel by pixel, for performing pattern comparison of the respective master pattern areas with an area of an object pattern. The object pattern is deemed defective when all of the comparisons indicate pattern mismatches. The pattern is deemed not defective when at least one comparison indicates a pattern match. Thus, even if an inspected object includes misregistration errors, pattern defects can be detected with high accuracy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.