Process for defining organic sidewall structures
US4838991A · kind A · utility
234Cited by
8References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 20, 1988 |
| Grant date | Jun 13, 1989 |
| Priority date | — |
| Expiry date | Jun 20, 2008 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/947
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A conformal organic layer is used to define spacers on the sidewalls of an organic mandrel. The organic layer (e.g., parylene) can be deposited at low temperatures, and as such is compatible with temperature-sensitive mandrel materials that reflow at high deposition temperatures. The conformal organic material can be dry etched as the same rate as the organic mandrels, while being resistant to wet strip solvents that remove the organic mandrels. This series of etch characteristics make the organic mandrel-organic spacer combination compatible with a host of masking applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.