Patent · US Expired

Process and composition for drying of gaseous hydrogen halides

US4853148A · kind A · utility

38Cited by
4References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 24, 1987
Grant dateAug 1, 1989
Priority date
Expiry dateMar 24, 2007

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S34/01
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A process for drying a gaseous hydrogen halide of the formula HX, wherein X is selected from the group consisting of bromine, chlorine, fluorine, and iodine, to remove water impurity therefrom, comprising: contacting the water impurity-containing gaseous hydrogen halide with a scavenger including a support having associated therewith one or more members of the group consisting of: PA1 (a) an active scavenging moiety selected from one or more members of the group consisting of: PA2 (i) metal halide compounds dispersed in the support, of the formula MX.sub.y ; and PA2 (ii) metal halide pendant functional groups of the formula -MX.sub.y-1 covalently bonded to the support, PA1 wherein M is a y-valent metal, and y is an integer whose value is from 1 to 3; PA1 (b) corresponding partially or fully alkylated compounds and/or pendant functional groups, of the metal halide compounds and/or pendant functional groups of (a); wherein the alkylated compounds and/or pendant functional groups, when present, are reactive with the gaseous hydrogen halide to form the corresponding halide compounds and/or pendant functional groups of (a); and M being selected such that the heat of formation, .DELTA.H.…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.