Process for surface treatment
US4857137A · kind A · utility
497Cited by
3References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 2, 1987 |
| Grant date | Aug 15, 1989 |
| Priority date | — |
| Expiry date | Feb 2, 2007 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32136
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An ion beam is allowed to hit the surface of a target and the resulting forward scattered particle beam is then allowed to hit the surface of a workpiece, thereby etching or modifying the surface of the workpiece or depositing a film on the surface of the workpiece. By bombardment of ions with the target, electric charges possessed by the ion beam are lost, and only the thus neutralized forward scattered particle beam is allowed to hit the surface of the workpiece, and thus the said surface treatment can be carried out without any electrically charging trouble.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.