Monolithically integrated semiconductor device containing bipolar junction transistors, CMOS and DMOS transistors and low leakage diodes and a method for its fabrication
US4887142A · kind A · utility
87Cited by
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1Claims
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Key dates
| Filing date | Nov 28, 1988 |
| Grant date | Dec 12, 1989 |
| Priority date | — |
| Expiry date | Nov 28, 2008 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/401
Abstract
Disclosed is a monolithic integrated semiconductor device which may contain specimens of seven different circuit components; namely: lateral N-MOS and lateral P-MOS transistors (CMOS), vertical N-DMOS and vertical P-DMOS transistors, vertical NPN bipolar transistors, vertical PNP bipolar transistors with isolated collector and low leakage junction diodes as well as a process for fabricating such a device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.