Projection exposure apparatus
US4965630A · kind A · utility
31Cited by
2References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 15, 1989 |
| Grant date | Oct 23, 1990 |
| Priority date | — |
| Expiry date | Dec 15, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70241
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a projection exposure apparatus comprising: a reticle stage; an illumination optical system for illuminating a reticle on the reticle stage; a stage on which a substrate is supported; and a projection optical system having a predetermined numerical aperture to project a pattern formed on the reticle and illuminated by the illumination optical system onto the substrate, and in which a longitudinal spherial aberration thereof regarding the focusing of the pattern formed on the reticle onto the substrate are excessively corrected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.