Patent · US Expired

Semiconductor device with a split conduction channel

US4977435A · kind A · utility

11Cited by
1References
29Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 31, 1988
Grant dateDec 11, 1990
Priority date
Expiry dateOct 31, 2008

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A semiconductor field effect transistor is provided which permits controlling of the phase of carriers between a source region and a drain region formed in a first semiconductor layer. Such control can be used to modulate characteristics such as the electric conductivity and drain current of the transistor. To accomplish this control, a gate electrode is formed over a portion of said first semiconductor layer between the source and drain regions. The gate electrode splits to form first and second branches at a first location adjacent to the source region. These first and second branches subsequently rejoin one another at a second location adjacent to said drain region. When a potential is applied to the gate electrode, it will produce first and second two-dimensional carriers conduction paths at a surface of the portion of the first semiconductor layer under the first and second branches. An arrangement is provided for modifying the phase of carriers passing through the first conduction path relative to the phase of carriers passing through the second conduction path to produce a phase difference for carriers received at the drain region through said first and second conduction pat…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.