Apparatus for coating a photo-resist film and/or developing it after being exposed
US4985722A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Feb 10, 1989 |
| Grant date | Jan 15, 1991 |
| Priority date | — |
| Expiry date | Feb 10, 2009 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/136
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus is disclosed which forms a photo-resist film on a substrate surface and/or develops it. A passage provided such that it extends in a predetermined direction to allow conveying of a substrate having a surface on which a photoresist film is to be formed or a substrate having a photo-resist film to be developed, a plurality of treating units necessary for forming a photo-resist film and/or a plurality of treating units necessary for developing the photo-resist film, these units being provided along the passage, conveying means movable along a predetermined course for conveying the substrate in a predetermined direction, substrate handling means provided on the conveying means for holding a substrate and for setting a substrate into the treating unit, said substrate handling means being movable and rotatable in any direction, and control means for selecting said plurality of treating units in any combination and for controlling operations of the conveying means and substrate handling means so that the substrate undergoes predetermined treatments at the selected units in any sequence.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.