Patent · US Expired

Rotary wafer drier

US4987687A · kind A · utility

28Cited by
3References
8Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 27, 1989
Grant dateJan 29, 1991
Priority date
Expiry dateSep 27, 2009

Classification

  • Technology area (CPC F)Mechanical Engineering; Lighting; Heating
  • CPC primaryF26B5/08
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A rotary wafer drying apparatus comprises a rotatable rotor for applying centrifugal force to the wafers, and a motor for rotating the rotor. A pair of cradles, attached to the rotor, receive a plurality of wafers arranged vertically. When the wafers are to be dried, the cradles are rotated by about 90.degree. from the state of reception, with the wafers maintained approximately at the horizontal state. When wafers of different diameters are to be dried and the size of the cradles should be changed correspondingly, not the rotor itself but only the pair of cradles in the rotor are changed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.