Method and control arrangement for the evaporation rate of an electron beam
US5003151A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 8, 1989 |
| Grant date | Mar 26, 1991 |
| Priority date | — |
| Expiry date | Nov 8, 2009 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/305
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The average evaporation rate over a predetermined area to be evaporated is controlled by moving an electron beam over said area wherein one characteristic of the electron beam is controlled in order to influence the evaporation rate. The electron beam is moved along a path according to stored maps wherein each position to which the electron beam is moved has assigned thereto substantially equal control values. In a first technique, each of the individual stored maps are selected in a sequential fashion to minimize the number of changes in the control value during a complete scan of the area being evaporated. In another technique, the control value of a predetermined position is compared against a predetermined number of stored control values, which is preferably all of the control values stored in a memory. The position data having associated control values which differ from the control value of the predetermined position by a predetermined minimal amount are stored as a map and thereafter utilized to control the electron beam so that the characteristic of the electron beam being controlled is maintained substantially constant for all of those positions stored as a map. In still an…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.