Method of producing an image reversal negative photoresist having a photo-labile blocked imide
US5019488A · kind A · utility
24Cited by
9References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 24, 1990 |
| Grant date | May 28, 1991 |
| Priority date | — |
| Expiry date | Apr 24, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for producing a negative image by coating a substrate with a photosensitive layer containing a blocked hydrophobic polymer capable of deblocking in the presence of an acid, and an oxime sulfonate ester or o-quinone-4-sulfonyl-containing diazide, then imagewise exposing, treating with a gaseous base, removing excess base, overall flood exposing, baking and developing with an aqueous alkaline solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.