Method for improving the planarity of etched mirror facets
US5032219A · kind A · utility
37Cited by
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7Claims
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Key dates
| Filing date | Jun 6, 1990 |
| Grant date | Jul 16, 1991 |
| Priority date | — |
| Expiry date | Jun 6, 2010 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/0203
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method, and device produced therewith, for improving the planarity of etched mirror facets 18 of integrated optic structures with non-planar stripe waveguides, such as ridge or groove diode lasers or passive devices such as modulators and switches. The curvature of the mirror facet surface at the edges of the waveguide due to topographical, lithographical and etch process effects, causes detrimental phase distortions, and is avoided by widening the waveguide end near the mirror surface thereby shifting the curved facet regions away from the light mode region to surface regions where curvature is not critical.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.