Negative photoresist and use thereof
US5041358A · kind A · utility
5Cited by
19References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 17, 1989 |
| Grant date | Aug 20, 1991 |
| Priority date | — |
| Expiry date | Apr 17, 2009 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0758
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A composition containing a polymeric material obtained by interreacting an epoxy-novolak polymer with an organosilicon compound, a radiation sensitive onium salt, and a near U.V. sensitizer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.