Method and apparatus for evaluating the capacitance of an integrated electronic device using an E beam
US5097204A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 3, 1990 |
| Grant date | Mar 17, 1992 |
| Priority date | — |
| Expiry date | Oct 3, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/305
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for testing an integrated electronic device wherein the integrated electronic device to be tested is placed on a sample table. A predetermined position of the integrated electronic device is irradiated with the primary charged beam. A substrate current flowing through a substrate of the integrated electronic device is measured upon radiation of the primary charged beam, and then a potential of the predetermined position irradiated with the primary charged beam is nondestructively measured in accordance with secondary electrons emitted from the predetermined position. A function of the integrated electronic device is evaluated in accordance with the substrate current and the predetermined position potential. The function to be evaluated includes leakage characteristics and a capacitance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.