Patent · US Expired

Method and apparatus for integrating optical sensor into processor

US5101764A · kind A · utility

4Cited by
5References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 20, 1991
Grant dateApr 7, 1992
Priority date
Expiry dateFeb 20, 2011

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67253
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method and apparatus for sensing radiation 26 indicative of at least one process variable in a semiconductor process chamber 10 in which a reactant gas reacts to effect changes in a silicon wafer 12. The method comprises positioning a substantially transparent window 22 in a conduit 14 leading to the wafer 12 and then flowing the reactant gas in the conduit 14 past the window 22 and toward the wafer 12. The radiation 26 is then sensed through the window 22. In the preferred embodiment the window 22 is positioned with an optical path along the center axis of the conduit 14. Other systems and methods are also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.