Method and apparatus for integrating optical sensor into processor
US5101764A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 20, 1991 |
| Grant date | Apr 7, 1992 |
| Priority date | — |
| Expiry date | Feb 20, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for sensing radiation 26 indicative of at least one process variable in a semiconductor process chamber 10 in which a reactant gas reacts to effect changes in a silicon wafer 12. The method comprises positioning a substantially transparent window 22 in a conduit 14 leading to the wafer 12 and then flowing the reactant gas in the conduit 14 past the window 22 and toward the wafer 12. The radiation 26 is then sensed through the window 22. In the preferred embodiment the window 22 is positioned with an optical path along the center axis of the conduit 14. Other systems and methods are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.