Improved planar etched mirror facets
US5103493A · kind A · utility
20Cited by
5References
6Claims
0Family size
Inventors
Key dates
| Filing date | Mar 15, 1991 |
| Grant date | Apr 7, 1992 |
| Priority date | — |
| Expiry date | Mar 15, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/0203
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method, and device produced therewith, for improving the planarity of etched mirror facets 18 of integrated optic structures with non-planar stripe waveguides, such as ridge or groove diode lasers or passive devices such as modulators and switches. The curvature of the mirror facet surface at the edges of the waveguide due to topographical, lithographical and etch process effects, causes detrimental phase distortions, and is avoided by widening the waveguide end near the mirror surface thereby shifting the curved facet regions away from the light mode region to surface regions where curvature is not critical.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.