Method and apparatus for vapor deposition of material onto a substrate
US5104695A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 8, 1989 |
| Grant date | Apr 14, 1992 |
| Priority date | — |
| Expiry date | Sep 8, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/243
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus for depositing the material onto a substrate is provided. The apparatus includes a mesh member which has impregnated therein the material which is to be vapor deposited. The mesh member with the material thereon is heated to vaporize the material and the vaporized material is then deposited onto the desired substrate. Preferably the material that is deposited is maintained in a crucible having an opening and the mesh member is disposed over the opening. The material in the crucible is vaporized and condensed onto the mesh member, and the condensed material wicks through the mesh member and then revaporizes from the top of the mesh member and is deposited onto the substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.