Multifunctional photolithographic compositions
US5110697A · kind A · utility
20Cited by
3References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 13, 1990 |
| Grant date | May 5, 1992 |
| Priority date | — |
| Expiry date | Dec 13, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/094
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photolithographic composition having improved processability and which eliminates the need for inter layering multiple special purpose coatings in the production of micro-electronic devices is surprisingly made possible by selective dissolution of poly(vinylpyridine) and an effective light attenuating material in critical solvents.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.