Method for controlling specific resistance of single crystal and an apparatus therefor
US5129986A · kind A · utility
12Cited by
4References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 16, 1990 |
| Grant date | Jul 14, 1992 |
| Priority date | — |
| Expiry date | Nov 16, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1032
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for controlling a specific resistance of a single crystal in a Czochralski-method type single crystal pulling apparatus having a hermetical chamber in which the single crystal is pulled up from a polycrystal melt and an inert gas supply and exhaust system by means of which an inert gas is supplied to the hermetical chamber and exhausted therefrom; the method being characterized in that the pneumatic pressure in the hermetical chamber and the supply rate of the inert gas are controlled in accordance with a prepared control pattern with respect to the passage of pulling time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.