Energy beam locating
US5136169A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 5, 1991 |
| Grant date | Aug 4, 1992 |
| Priority date | — |
| Expiry date | Apr 5, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3175
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of monitoring the travel of a beam of energy on a substrate having a fiducial pattern rigidly fixed relative to the substrate, the pattern embracing an area where the beam can create a useful image with submicron precision. The method includes: adjusting the beam such that the dose delivered by the beam is sufficiently high to generate a signal produced by the interaction of the beam and the fiducial pattern, the signal being representative of the relative position of the fiducial pattern and the travel, the dose being sufficiently low so that the area of the substrate over which the beam passes remains receptive to subsequent creation, with submicron precision, of a useful image; moving the beam across the substrate; detecting the signal produced by the interaction of the beam with the fiducial pattern; and comparing the detected signal with a predetermined signal to provide a position signal representative of the beam travel with submicron precision.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.