Exposure apparatus
US5138643A · kind A · utility
26Cited by
19References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 1, 1990 |
| Grant date | Aug 11, 1992 |
| Priority date | — |
| Expiry date | Oct 1, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70866
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes a chamber for placing an article in a predetermined ambience; a holding device for holding the article in the chamber; a fluid supplying device for supplying a temperature adjusting fluid into the holding device through a flow passageway; a detecting device for detecting leakage of the fluid from the flow passageway; and a flow rate controlling device for controlling the flow rate of the fluid to be supplied to the holding device on the basis of the detection by the detecting device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.