Method of semiconductor surface measurment and an apparatus for realizing the same
US5140272A · kind A · utility
23Cited by
14References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 23, 1988 |
| Grant date | Aug 18, 1992 |
| Priority date | — |
| Expiry date | Sep 23, 2008 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R27/2605
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of semiconductor surface measurement for measuring electrical characteristics of a surface of a semiconductor body is disclosed, by which an electrode, whose surface, which is opposite to the surface of a semiconductor substrate, is flat and the gap between the electrode and the surface is smaller than 0.5 .mu.m.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.