Apparatus for coating a photo-resist film and/or developing it after being exposed
US5177514A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 14, 1990 |
| Grant date | Jan 5, 1993 |
| Priority date | — |
| Expiry date | Dec 14, 2010 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/137
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The resist-processing system according to the present invention includes at least one processing sections having a plurality of treatment units for performing various kinds of treatments on a semiconductor wafer such as the coating process and baking process, a loading section connected to the processing section for supplying the wafer to the processing section, a vacuum tweezer for carrying the wafer in the loading section so as to transfer the wafer from the loading section to the processing section, a handling robot for receiving the wafer from said loading section and transferring it in the processing section so as to load and unload the wafer to/from each of the treatment units, control means for controlling the operations of the vacuum tweezer and the handling robot in accordance with a predetermined program, and a passage provided in the processing section in such a manner the passage is disposed along with said plurality of treating units. Further, the handling robot travels through the passage in accordance with the predetermined program from the control means so as to stop by each of the treatment units in the order of the treatments required by the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.