Apparatus and method for substrate heating utilizing various infrared means to achieve uniform intensity
US5179677A · kind A · utility
88Cited by
14References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 6, 1991 |
| Grant date | Jan 12, 1993 |
| Priority date | — |
| Expiry date | Feb 6, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/481
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A reflector array employs a number of linear, tubular heater lamps arranged in a circle concentric with the substrate to be heated. Some of the lamps have focusing reflectors and the remainder have dispersive reflectors. A peripheral cylindrical reflector surrounds the lamps and their associated reflectors. The combined reflectors permit balancing the thermal radiation intensity across the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.