Thomas E. Deacon
8Patents
6h-index
9Co-inventors
52Inventor score
Filing activity: Apr 18, 1989 → Sep 12, 2000
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5194401A | Thermally processing semiconductor wafers at non-ambient pressures | Chemistry; Metallurgy | 541 | Expired |
| US4920918A | Pressure-resistant thermal reactor system for semiconductor processing | Chemistry; Metallurgy | 376 | Expired |
| US5792269A | Gas distribution for CVD systems | Chemistry; Metallurgy | 115 | Expired |
| US5179677A | Apparatus and method for substrate heating utilizing various infrared means to achieve uniform intensity | Chemistry; Metallurgy | 88 | Expired |
| US6149987A | Method for depositing low dielectric constant oxide films | Electricity | 34 | Expired |
| US6476362B1 | Lamp array for thermal processing chamber | Electricity | 24 | Expired |
| US6523494B1 | Apparatus for depositing low dielectric constant oxide film | Electricity | 3 | Expired |
| US6171966A | Delineation pattern for epitaxial depositions | Electricity | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.