Resist process system
US5202716A · kind A · utility
81Cited by
3References
11Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jun 25, 1992 |
| Grant date | Apr 13, 1993 |
| Priority date | — |
| Expiry date | Jun 25, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67742
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which is to be processed. The waiting unit is arranged beside the passage and between the process units and it includes plural compartments partitioned in it.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.