Laminar flow gas diffuser
US5209402A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 24, 1991 |
| Grant date | May 11, 1993 |
| Priority date | — |
| Expiry date | May 24, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/564
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A laminar flow diffuser has a plurality of round, thin, stacked plates. A central bore penetrates all the plates with the exception of the bottom plate. The diffuser is secured to the vacuum chamber port. When gas enters the port, it enters the central bore and then flows radially outward through the interplate spaces to the outer circumference of the plates and subsequently into the periphery of the chamber. The diffuser thereby provides a controlled laminar flow which prevents turbulence in the chamber and hence, reduces the possibility of contamination to the workpiece in the chamber. The laminar flow diffuser is easily cleaned, both during its initial assembly and later after use, because it chiefly has flat surfaces which do not harbor dirt or gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.