Vertical wafer heat treatment apparatus having dual load lock chambers
US5217501A · kind A · utility
79Cited by
5References
20Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jul 12, 1991 |
| Grant date | Jun 8, 1993 |
| Priority date | — |
| Expiry date | Jul 12, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67757
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A vertical wafer heat treatment apparatus for for forming a film on and dry etching a plurality of wafers stored in a wafer boat. The apparatus has at least first and second load lock chambers connected by a gate. Each load lock has an inert gas independently introduced therein and exhausted therefrom. The load lock chambers are vertically connected between two separate process containers. An elevator is provided in the first load lock chamber to transfer a wafer boat into and out of the first container. A transfer means is provided in the second load lock to transfer wafers into and out of a wafer boat.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.