Positive photoresist containing dyes

US5225312A · kind A · utility

Assignee

• Morton International, Inc. · US

Inventors

• Sunit S. Dixit · Mission Viejo, US
• Richard M. Lazarus · Mission Viejo, US
• Thomas P. Carter · Olney, US
• Joseph E. Oberlander · Phillipsburg, US
• Andreas Goehring · Tustin, US
• Randall W. Kautz · Irvine, US
• Grieg B. Beltramo · Orange, US

Key dates

• Filing date: Aug 2, 1991
• Grant date: Jul 6, 1993
• Expiry date: Aug 2, 2011

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/091
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A positive photoresist of the type containing an alkali-soluble novolac resin and a quinone diazide sensitizer contains a dye of the general formula: ##STR1## wherein R' is lower alkyl, R" is H, alkyl or CO.sub.2 -alkyl, alkyl-CO.sub.2 -alkyl or alkyl-CO.sub.2 -(C.sub.1 -C.sub.3 alkyl-O).sub.n -alkyl (n=1-3) and wherein said dye is compatible with the novolac resin/quinone diazide formulation to at least 0.1 phr. The dye reduces reflective notching. Preferably the photoresist also contain a nitro naphthol dye to reduce the effects of I-Line radiation.