Apparatus and method for improving the endurance of floating gate devices
US5231602A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 25, 1990 |
| Grant date | Jul 27, 1993 |
| Priority date | — |
| Expiry date | Apr 25, 2010 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C16/14
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An apparatus and method for improving the reliability of floating gate transistors used in memory cell applications by controlling the electric field induced across the tunnel oxide region of the floating gate transistor when discharging electrons from floating gate is provided. The invention comprises method and apparatus for varying the resistance applied to the drain electrode of the floating gate device and/or varying the voltage applied to the source electrode of the floating gate device to control the electric field in the tunnel oxide region of the floating gate device. In the preferred embodiment of the invention utilized in an EEPROM memory cell, both a method and an apparatus applying a variable resistance and a method and an apparatus applying a variable voltage are utilized simultaneously. The method and apparatus provide an optimal electric field intensity to control electron tunneling in the tunnel region of the floating gate device during discharge of electrons from the floating gate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.