Polymers with intrinsic light-absorbing properties for anti-reflective coating applications in deep ultraviolet microlithography
US5234990A · kind A · utility
36Cited by
4References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 12, 1992 |
| Grant date | Aug 10, 1993 |
| Priority date | — |
| Expiry date | Feb 12, 2012 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08J3/091
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.