Apple-shaped magnetron for sputtering system
US5248402A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 29, 1992 |
| Grant date | Sep 28, 1993 |
| Priority date | — |
| Expiry date | Jul 29, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3408
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A sputtering system magnetron formed of an array of permanent magnets rotated in proximity to a plane of a target disposed in a vacuum chamber has an improved shape resembling a cross section of an apple. The magnetic path established between oppositely poled pairs of magnets is inturned in a stem region proximate to the axis of rotation for the array and has a pair of opposed lobes extending outward from the stem region in a generally semi-circular form. The lobes lead to and join each other in an indent region opposite the stem region. The maximum distance across the path between the lobes is about double the minimum distance across the path between the stem region and the indent region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.