Vertically oriented CVD apparatus including gas inlet tube having gas injection holes
US5252133A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Dec 18, 1991 |
| Grant date | Oct 12, 1993 |
| Priority date | — |
| Expiry date | Dec 18, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B25/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vertically oriented CVD apparatus comprises a reaction chamber, a boat means vertically placed in the reaction chamber to horizontally support a plurality of semiconductor substrates, and a gas inlet tube including a plurality of gas injection holes along a longitudinal axis thereof and extending along a longitudinal side of the boat means to introduce a reaction gas into the reaction chamber. In the structure, a direction of each of the gas injection holes is set at an angle .theta. with respect to a reference line given by a straight line connecting a center of the gas inlet tube to a center of one of the semiconductor wafers, the angle .theta. being defined by 0.degree. < .theta. .ltoreq. 90.degree..
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.