Transfer apparatus
US5253663A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Aug 26, 1992 |
| Grant date | Oct 19, 1993 |
| Priority date | — |
| Expiry date | Aug 26, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A rotary transfer arm for transferring semiconductor wafers is disposed in a closed housing. A closable opening portion is formed in the housing, through which the transfer arm can extend out from the housing. A fork is disposed at the distal end of the transfer arm. A plurality of holding grooves are formed in the fork to set a plurality of wafers with predetermined intervals between them. A cleaner for the fork is disposed in the upper portion of the housing. The cleaner has cleaning and drying nozzles mounted at the distal end of a switch arm. The switch arm can pivot between an operation position and a standby position. The switch arm can also move the cleaning and drying nozzles along the fork. During cleaning and drying, pure water is sprayed from the cleaning nozzles against the fork, and a drying gas is sprayed from the drying nozzles against it.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.