Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
US5256522A · kind A · utility
7Cited by
33References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 30, 1991 |
| Grant date | Oct 26, 1993 |
| Priority date | — |
| Expiry date | Dec 30, 2011 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/168
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for converting a normally positive working photosensitive composition to a negative working composition is disclosed. One forms a composition containing an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound and an acid catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image. The image-reversal negative-working photoresists of this invention have superior storage stability and shelf life.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.