Photoresist develop and strip solvent compositions and method for their use
US5268260A · kind A · utility
80Cited by
11References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 22, 1991 |
| Grant date | Dec 7, 1993 |
| Priority date | — |
| Expiry date | Oct 22, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/325
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Simple, environmentally friendly developers and strippers are disclosed for free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and Vacrel photoresists. In all cases both the developers and the strippers include gamma butyrolactone, propylene carbonate and benzyl alcohol, optionally also including a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.