Method of producing a wafer having a curved notch
US5279992A · kind A · utility
10Cited by
6References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 25, 1992 |
| Grant date | Jan 18, 1994 |
| Priority date | — |
| Expiry date | Mar 25, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/978
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A wafer having chamfered bent portions in the joint regions between the contour of the wafer and the cut-away portion of the wafer such as an orientation flatness. The chipping of the wafer can be prevented, and in coating the wafer with a photoresist, forming an epitaxially grown layer on the wafer, etc., films having desired characteristics can be provided on the surface of the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.