Thin film planarization process for fabricating magnetic heads employing a stitched pole structure
US5282308A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 29, 1992 |
| Grant date | Feb 1, 1994 |
| Priority date | — |
| Expiry date | Dec 29, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49052
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for fabricating a thin film magnetic head assembly including the procedure of hardening a portion of the upper pole-tip photoresist mask to create a planarizing stitching pedestal in the region where the upper pole-tip overlaps with the upper pole-yoke. The upper pole assembly is deposited in two steps to create a stitched pole consisting of an upper pole-tip joined to an upper pole-yoke element at the stitching pedestal. The method reduces process complexity by eliminating masking steps and also eliminates the usual close alignment requirements for upper insulation and pole-yoke deposition procedures, thereby improving process yield.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.