Apparatus for manufacturing disc medium
US5289231A · kind A · utility
22Cited by
5References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 18, 1992 |
| Grant date | Feb 22, 1994 |
| Priority date | — |
| Expiry date | Dec 18, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70366
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This specification discloses a method of and an apparatus for manufacturing a disc medium which utilize the projection exposure technique of a stopper for lithography, rotate a circular photosensitive substrate which provides the disc medium at the same speed as a circular reticle having a pattern of information tracks while rotating the reticle, and irradiate the reticle with illuminating light of a slit-like shape or a sectoral shape extending in the diametrical direction of the circular reticle to thereby effect rotation scan exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.