Method for forming a patterned mask
US5290608A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 26, 1993 |
| Grant date | Mar 1, 1994 |
| Priority date | — |
| Expiry date | Jul 26, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/107
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A patterned mask is provided on a surface by formulating a liquid, 100% solids-type thermally curable mask composition, applying the composition as a film to the surface, selectively thermally exposing the film in the desired mask pattern using a focused beam of heat energy without use of an interposed patterned mask, and then developing away the film areas not thermally exposed so as to produce a patterned mask. The invention enables the elimination of potentially troublesome volatile solvent carriers or diluents from the composition, while at the same time still enabling production of finely-defined patterns without having to bring a patterned mask (cf. phototool) into contact with the composition. Similarly, the expense involved with use of dry film photo-sensitive masks is avoided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.