Crosslinkable aqueous developable photoresist compositions and method for use thereof
US5296332A · kind A · utility
35Cited by
6References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 22, 1991 |
| Grant date | Mar 22, 1994 |
| Priority date | — |
| Expiry date | Nov 22, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/038
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
High sensitivity, high contrast, heat-stable resist compositions for use in deep UV, i-line e-beam and x-ray lithography. These compositions comprise a film-forming polymer having aromatic rings activated for electrophilic substitution, an acid catalyzable crosslinking agent which forms a hydroxy-stabilized carbonium ion, and a photoacid generator. The compositions are aqueous base developable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.