Electro-optic monitor for fluid spray pattern
US5312039A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 22, 1992 |
| Grant date | May 17, 1994 |
| Priority date | — |
| Expiry date | Jun 22, 2012 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05B12/082
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Method and apparatus for monitoring the fluid spray pattern of fluid sprayed by a nozzle onto a semiconductor wafer during processing of the wafer. A light source is positioned to illuminate the fluid sprayed in a pattern P from the nozzle, and one or more photodetectors are positioned to receive light scattered by the fluid spray. Each photodetector develops an electrical signal in response to receipt of the scattered light, and these electrical signals are received and analyzed by a comparison means. One or more reference signals representing a desired fluid spray pattern P.sub.0 is stored in the comparison means, and each electrical signal for the pattern P is compared with the corresponding reference signal for the pattern P.sub.0 by the comparison means. If one or more signal for the pattern P differs substantially from the corresponding reference signal for the desired pattern P.sub.0, an alarm may be generated and/or delivery of fluid by the nozzle may be terminated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.