Method of cleaning a charged beam apparatus
US5312519A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 2, 1992 |
| Grant date | May 17, 1994 |
| Priority date | — |
| Expiry date | Jul 2, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/022
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of cleaning a charged beam irradiating apparatus having a part exposed to a charged beam in a vacuum chamber to contaminate the part with organic contaminations, the method including the selective introduction of electrically neutral active species into the vacuum chamber, after it has been exhausted, to remove the contaminations from the part by exposure to the introduced neutral active species. The neutral active species are formed outside of the chamber in a plasma discharging gas with other species including electrons or positive ions. Only the electrically active neutral species are selected for introduction into the evacuated container.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.