Resist processing method
US5339128A · kind A · utility
54Cited by
6References
30Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Mar 15, 1993 |
| Grant date | Aug 16, 1994 |
| Priority date | — |
| Expiry date | Mar 15, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/136
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist process system of the present invention includes at least two robots for conveying a wafer, a passage through which the robots can move, plural process units arranged along the passage, and a waiting unit for temporarily holding the wafer which is to be processed. The waiting unit is arranged beside the passage and between the process units and it includes plural compartments partitioned in it.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.