Plasma processing apparatus including condensation preventing means
US5342471A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 20, 1992 |
| Grant date | Aug 30, 1994 |
| Priority date | — |
| Expiry date | Apr 20, 2012 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S156/914
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plasma processing apparatus having a pair of electrodes which are installed alternately in parallel in a chamber and in which an object to be processed is placed at one electrode thereof, radiofrequency applying device for applying radiofrequency power between the pair of electrodes, cooling device for cooling the object, drying-gas introducing tube for supplying a drying gas into the chamber, and dropwise-condensation preventing member installed at a portion of the chamber so as to be in contact with the outer atmosphere. The apparatus can prevent dropwise condensation at the time of cooling and at the same time prevent the occurrence of radiofrequency leakage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.