Microlithographic substrate cleaning and compositions therefor
US5362608A · kind A · utility
32Cited by
6References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 24, 1992 |
| Grant date | Nov 8, 1994 |
| Priority date | — |
| Expiry date | Aug 24, 2012 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/422
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
THFA (tetrahydrofurfuryl alcohol) is employed as the active component of edge bead removal compositions negating the need for N-methylpyrrolidone and providing unexpected effectiveness for multilayer microelectronic edge beads having at least one highly polar aromatic polymer layer, particularly when such layer is adjacent to an acid-catalyzed photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.