Photolithographic article utilizing polymers with light-absorbing properties for anti-reflective coating
US5368989A · kind A · utility
10Cited by
4References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 30, 1993 |
| Grant date | Nov 29, 1994 |
| Priority date | — |
| Expiry date | Apr 30, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.