Substrate drying apparatus
US5369891A · kind A · utility
Assignees
Inventor
Key dates
| Filing date | Aug 24, 1993 |
| Grant date | Dec 6, 1994 |
| Priority date | — |
| Expiry date | Aug 24, 2013 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF26B21/14
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A substrate drying apparatus comprising a vessel in which IPA is contained, a chamber enclosing the vessel, a heating heater for heating IPA into vapor in the vessel and in that region in the vessel where a plurality of substrates are vapor-processed, a mechanism for carrying the plural water-washed substrates into the vapor-processing region in the vessel, a mechanism located above the vapor-processing region in the vessel to cool the IPA vapor into solution drops, region in the chamber located above the cooling mechanism where the substrates can be dried while removing IPA from the substrates, and gas supply and exhaust devices for causing gas to flow from above to below in the drying region in the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.