Method for forming a substantially uniform array of sharp tips
US5391259A · kind A · utility
112Cited by
20References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 21, 1994 |
| Grant date | Feb 21, 1995 |
| Priority date | — |
| Expiry date | Jan 21, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2201/30403
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for forming a substantially uniform array of atomically sharp emitter tips, comprising: patterning a substrate with a mask, thereby defining an array; isotropically etching the array to form pointed tips; and removing the mask when substantially all of the tips have become sharp. A mask having a composition and dimensions which enable the mask to remain balanced on the apex of the tips until all of the tips are of substantially the same shape is used to form the array of substantially uniform tips.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.