Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol
US5395727A · kind A · utility
3Cited by
7References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 29, 1993 |
| Grant date | Mar 7, 1995 |
| Priority date | — |
| Expiry date | Nov 29, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0236
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A novolak resin made from a carbonyl compound and a specific phenol compound, which resin has good properties, in particular, as a base resin of a photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.